M. Gribelyuk: search on Z-Library

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1

The Number of "Magic" Squares, Cubes, and Hypercubes

Matthias Beck, Moshe Cohen, Jessica Cuomo and Paul Gribelyuk

Journal:

American Mathematical Monthly

Year:

2003

Language:

english

File:

PDF, 1.04 MB

english, 2003

2

Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching

R.G Filippi, M.A Gribelyuk, T Joseph, T Kane, T.D Sullivan, L.A Clevenger, G Costrini, J Gambino, R.C Iggulden, E.W Kiewra, X.J Ning, R Ravikumar, R.F Schnabel, G Stojakovic, S.J Weber, L.M Gignac, C.

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 988 KB

english, 2001

3

Advanced salicides for 0.10 μm CMOS: Co salicide processes with low diode leakage and Ti salicide processes with direct formation of low resistivity C54 TiSi2

J.A. Kittl, Q.Z. Hong, H. Yang, N. Yu, S.B. Samavedam, M.A. Gribelyuk

Journal:

Thin Solid Films

Year:

1998

Language:

english

File:

PDF, 953 KB

english, 1998

4

Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications

E.P. Gusev, C. Cabral Jr., M. Copel, C. D’Emic, M. Gribelyuk

Journal:

Microelectronic Engineering

Year:

2003

Language:

english

File:

PDF, 584 KB

english, 2003

5

[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - A high performance 90nm SOI technology with 0.992 μm/sup 2/ 6T-SRAM cell

Khare, M., Ku, S.H., Donaton, R.A., Greco, S., Brodsky, C., Chen, X., Chou, A., DellaGuardia, R., Deshpande, S., Doris, B., Fung, S.K.H., Gabor, A., Gribelyuk, M., Holmes, S., Jamin, F.F., Lai, W.L.,

Year:

2002

Language:

english

File:

PDF, 282 KB

english, 2002

6

[IEEE 2016 International Conference on IC Design and Technology (ICICDT) - Ho Chi Minh, Vietnam (2016.6.27-2016.6.29)] 2016 International Conference on IC Design and Technology (ICICDT) - Extending HKMG scaling on CMOS with FDSOI: Advantages and integration challenges

Triyoso, D.H., Carter, R., Kluth, J., Hempel, K., Gribelyuk, M., Kang, L., Kumar, A., Mulfinger, B., Javorka, P., Punchihewa, K., Child, A., McArdle, T., Holt, J., Straub, S., Sporer, R., Chen, P.

Year:

2016

Language:

english

File:

PDF, 1.29 MB

english, 2016

7

Advances in Elemental Electron Tomography for the State-of-the-art Semiconductor Devices and Circuits Characterization and Failure Analysis

Fu, B., Gribelyuk, M, Baumann, Frieder H., Fang, C., Zhao, Wayne, Chen, E., Brooks, I.

Journal:

Microscopy and Microanalysis

Year:

2017

Language:

english

File:

PDF, 299 KB

english, 2017

8

The Number of “Magic” Squares, Cubes, and Hypercubes

Beck, Matthias, Cohen, Moshe, Cuomo, Jessica, Gribelyuk, Paul

Journal:

American Mathematical Monthly

Year:

2003

Language:

english

File:

PDF, 323 KB

english, 2003

9

Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV

David C. Gilmer, Daniel G. Colombo, Charles J. Taylor, Jeff Roberts, Greg Haugstad, Stephen A. Campbell, Hyeon-Seag Kim, Glen D. Wilk, Michael A. Gribelyuk, Wayne L. Gladfelter

Journal:

Chemical Vapor Deposition

Year:

1998

Language:

english

File:

PDF, 272 KB

english, 1998

10

HREM of epitaxial layers in the InAs/GaAs system

V.Yu. Karasev, N.A. Kiselev, E.V. Orlova, M.A. Gribelyuk, A.K. Gutakovsky, Yu.O. Kanter, S.M. Pintus, S.V. Rubanov, S.I. Stenin, A.A. Fedorov

Journal:

Ultramicroscopy

Year:

1991

Language:

english

File:

PDF, 1.43 MB

english, 1991

11

Determination of the imaging conditions in off-axis side-band STEM holography

M.A. Gribelyuk, J.M. Cowley

Journal:

Ultramicroscopy

Year:

1992

Language:

english

File:

PDF, 668 KB

english, 1992

12

Computer analysis of side-band holography in STEM

M.G. Gribelyuk, J.M. Cowley

Journal:

Ultramicroscopy

Year:

1992

Language:

english

File:

PDF, 620 KB

english, 1992

13

On the iterative restoration of the exit plane wave function from defocus series in HREM

M.A. Gribelyuk, J.L. Hutchison

Journal:

Ultramicroscopy

Year:

1992

Language:

english

File:

PDF, 4.61 MB

english, 1992

14

Determination of experimental imaging conditions for off-axis transmission electron holography

M.A. Gribelyuk, J.M. Cowley

Journal:

Ultramicroscopy

Year:

1993

Language:

english

File:

PDF, 1.18 MB

english, 1993

15

Ni–Pt silicide formation through Ti mediating layers

Paul Besser, Christian Lavoie, Ahmet Ozcan, Conal Murray, Jay Strane, Keith Wong, Michael Gribelyuk, Yun-Yu Wang, Christopher Parks, Jean Jordan-Sweet

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 1.17 MB

english, 2007

16

Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks

M.A. Gribelyuk, C. Cabral Jr., E.P. Gusev, V. Narayanan

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 1.37 MB

english, 2007

17

Off-axis electron holography with a dual-lens imaging system and its usefulness in 2-D potential mapping of semiconductor devices

Y.Y. Wang, M. Kawasaki, J. Bruley, M. Gribelyuk, A. Domenicucci, J. Gaudiello

Journal:

Ultramicroscopy

Year:

2004

Language:

english

File:

PDF, 483 KB

english, 2004

18

Growth and microstructure of Si/CaF2/Si(111) heterostructures

M.A. Gribelyuk, G.D. Wilk

Journal:

Thin Solid Films

Year:

1999

Language:

english

File:

PDF, 1.42 MB

english, 1999

19

Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

E.P Gusev, E Cartier, D.A Buchanan, M Gribelyuk, M Copel, H Okorn-Schmidt, C D’Emic

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 1.05 MB

english, 2001

20

High resolution composition profiles of multilayers

F. H. Baumann, M. Gribelyuk, Y. Kim, C. Kisielowski, J-L. Maurice, W.-D. Rau, J. A. Rentschler, P. Schwander, A. Ourmazd

Journal:

physica status solidi (a)

Year:

1995

Language:

english

File:

PDF, 1.29 MB

english, 1995

21

Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates

Tiezhong Ma, Campbell, S.A., Smith, R., Hoilien, N., Boyong He, Gladfelter, W.L., Hobbs, C., Buchanan, D., Taylor, C., Gribelyuk, M., Tiner, M., Coppel, M., Jang Jung Lee

Journal:

IEEE Transactions on Electron Devices

Year:

2001

Language:

english

File:

PDF, 207 KB

english, 2001

22

Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films

Callegari, A., Cartier, E., Gribelyuk, M., Okorn-Schmidt, H. F., Zabel, T.

Journal:

Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 718 KB

english, 2001

23

High-resolution depth profiling in ultrathin Al[sub 2]O[sub 3] films on Si

Gusev, E. P., Copel, M., Cartier, E., Baumvol, I. J. R., Krug, C., Gribelyuk, M. A.

Journal:

Applied Physics Letters

Year:

2000

Language:

english

File:

PDF, 434 KB

english, 2000

24

[IEEE IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - San Francisco, CA, USA (Dec. 13-15, 2004)] IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - Interface engineering for enhanced electron mobilities in W/HfO/sub 2/ gate stacks

Callegari, A., Jamison, P., Cartier, E., Zafar, S., Gusev, E., Narayanan, V., D'Emic, C., Lacey, D., Feely, F.Mc., Jammy, R., Gribelyuk, M., Shepard, J., Andreoni, W., Curioni, A., Pignedoli, C.

Year:

2004

Language:

english

File:

PDF, 221 KB

english, 2004

25

[IEEE 2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S) (Formerly known as SOI Conference) - Monterey, CA, USA (2013.10.7-2013.10.10)] 2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S) - UTBB FDSOI scaling enablers for the 10nm node

Grenouillet, L., Liu, Q., Wacquez, R., Morin, P., Loubet, N., Cooper, D., Pofelski, A., Weng, W., Bauman, F., Gribelyuk, M., Wang, Y., De Salvo, B., Gimbert, J., Cheng, K., Le Tiec, Y., Chanemougame,

Year:

2013

Language:

english

File:

PDF, 626 KB

english, 2013

26

[IEEE 2007 IEEE Symposium on VLSI Technology - Kyoto, Japan (2007.06.12-2007.06.14)] 2007 IEEE Symposium on VLSI Technology - High-Performance High-¿/Metal Gates for 45nm CMOS and Beyond with Gate-First Processing

Chudzik, M., Doris, B., Mo, R., Sleight, J., Cartier, E., Dewan, C., Park, D., Bu, H., Natzle, W., Yan, W., Ouyang, C., Henson, K., Boyd, D., Callegari, S., Carter, R., Casarotto, D., Gribelyuk, M., H

Year:

2007

Language:

english

File:

PDF, 543 KB

english, 2007

27

[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Dual work function metal gate CMOS using CVD metal electrodes

Narayanan, V., Callegari, A., McFeely, F.R., Nakamura, K., Jamison, P., Zafar, S., Cartier, E., Steegen, A., Ku, V., Nguyen, P., Milkove, K., Cabral, C., Gribelyuk, M., Wajda, C., Kawano, Y., Lacey, D

Year:

2004

Language:

english

File:

PDF, 190 KB

english, 2004

28

[IEEE 2009 International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2009.06.11-2009.06.12)] 2009 International Workshop on Junction Technology - Electron holography for 2-D dopant profiling

Gribelyuk, Michael A., Yuan, Jun, Gluschenkov, Oleg, Ronsheim, Paul, Huiling Shang,

Year:

2009

Language:

english

File:

PDF, 1.35 MB

english, 2009

29

[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Implementation of Robust Nickel Alloy Salicide Process for High-Performance 65nm SOI CMOS Manufacturing

Strane, Jay, Brown, David, Lavoie, Christian, Suenaga, Jun, Haran, Bala, Press, Patrick, Besser, Paul, Flaitz, Philip, Gribelyuk, Michael, Kammler, Thorsten, Peidous, Igor, Chen, Huajie, Waidmann, Ste

Year:

2007

Language:

english

File:

PDF, 927 KB

english, 2007

30

[IEEE International Electron Devices Meeting. Technical Digest - Washington, DC, USA (2-5 Dec. 2001)] International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224) - Ultrathin high-K gate stacks for advanced CMOS devices

Gusev, E.P., Buchanan, D.A., Cartier, E., Kumar, A., DiMaria, D., Guha, S., Callegari, A., Zafar, S., Jamison, P.C., Neumayer, D.A., Copel, M., Gribelyuk, M.A., Okorn-Schmidt, H., D'Emic, C., Kozlowsk

Year:

2001

Language:

english

File:

PDF, 380 KB

english, 2001

31

[IEEE Thirteenth Biennial University/Government/Industry Microelectronics Symposium - Minneapolis, MN, USA (20-23 June 1999)] Proceedings of the Thirteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.99CH36301) - High permittivity gate insulators TiO/sub 2/ and ZrO/sub 2/

He, B., Hoilien, N., Smith, R., Ma, T., Taylor, C., St. Omer, I., Campbell, S.A., Gladfelter, W.L., Gribelyuk, M., Buchanan, D.

Year:

1999

Language:

english

File:

PDF, 571 KB

english, 1999

32

[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Poly-Si/AlN/HfSiO Stack for Ideal Threshold Voltage and Mobility in Sub-100 nm MOSFETs

Lee, K., Frank, M., Paruchuri, V., Cartier, E., Linder, B., Bojarczuk, N., Wang, X., Rubino, J., Steen, M., Kozlowski, P., Newbury, J., Sikorski, E., Flaitz, P., Gribelyuk, M., Jamison, P., Singco, G.

Year:

2006

Language:

english

File:

PDF, 368 KB

english, 2006

33

[IEEE 2012 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2012.06.12-2012.06.14)] 2012 Symposium on VLSI Technology (VLSIT) - A novel low resistance gate fill for extreme gate length scaling at 20nm and beyond for gate-last high-k/metal gate CMOS technology

Kwon, U., Wong, K., Krishnan, S. A., Econimikos, L., Zhang, X., Ortolland, C., Thanh, L. D., Laloe, J.-B., Huang, J. Y., Edge, L. F., Wang, H. M., Gribelyuk, M. A., Rath, D. L., Bingert, R., Liu, Y.,

Year:

2012

Language:

english

File:

PDF, 452 KB

english, 2012

34

Mechanism of V[sub FB]/V[sub TH] shift in Dysprosium incorporated HfO[sub 2] gate dielectric n-Type Metal-Oxide-Semiconductor devices

Lee, Tackhwi, Choi, Kisik, Ando, Takashi, Park, Dae-Gyu, Gribelyuk, Michael A., Kwon, Unoh, Banerjee, Sanjay K.

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2011

Language:

english

File:

PDF, 1.00 MB

english, 2011

35

Interface reactions in ZrO[sub 2] based gate dielectric stacks

M. A. Gribelyuk, A. Callegari, E. P. Gusev, M. Copel, D. A. Buchanan

Year:

2002

Language:

english

File:

PDF, 1.08 MB

english, 2002

36

Electron holography of devices with epitaxial layers

Gribelyuk, M. A., Ontalus, V., Baumann, F. H., Zhu, Z., Holt, J. R.

Journal:

Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 2.73 MB

english, 2014

37

Interfacial oxide formation and oxygen diffusion in rare earth oxide–silicon epitaxial heterostructures

Narayanan, V., Guha, S., Copel, M., Bojarczuk, N. A., Flaitz, P. L., Gribelyuk, M.

Journal:

Applied Physics Letters

Year:

2002

Language:

english

File:

PDF, 606 KB

english, 2002

38

Structure and stability of ultrathin zirconium oxide layers on Si(001)

Copel, M., Gribelyuk, M., Gusev, E.

Journal:

Applied Physics Letters

Year:

2000

Language:

english

File:

PDF, 417 KB

english, 2000

39

Effect of Mo doping on accelerated growth of C-54 TiSi[sub 2]: Evidence for template mechanism

Gribelyuk, M. A., Kittl, J. A., Samavedam, S. B.

Journal:

Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 827 KB

english, 1999

40

Thermal stability of polycrystalline silicon/metal oxide interfaces

A. Callegari, E. Gousev, T. Zabel, D. Lacey, M. Gribelyuk, P. Jamison

Year:

2002

Language:

english

File:

PDF, 446 KB

english, 2002

41

Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics

Guha, S., Cartier, E., Gribelyuk, M. A., Bojarczuk, N. A., Copel, M. C.

Journal:

Applied Physics Letters

Year:

2000

Language:

english

File:

PDF, 408 KB

english, 2000

42

Scanning capacitance spectroscopy: An analytical technique for pn-junction delineation in Si devices

Edwards, Hal, McGlothlin, Rudye, San Martin, Richard, U, Elisa, Gribelyuk, Michael, Mahaffy, Rachel, Ken Shih, C., List, R. Scott, Ukraintsev, Vladimir A.

Journal:

Applied Physics Letters

Year:

1998

Language:

english

File:

PDF, 690 KB

english, 1998

43

[IEEE International Electron Devices Meeting. Technical Digest. IEDM - San Francisco, CA, USA (10-13 Dec. 2000)] International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) - 80 nm polysilicon gated n-FETs with ultra-thin Al/sub 2/O/sub 3/ gate dielectric for ULSI applications

Buchanan, D.A., Gusev, E.P., Cartier, E., Okorn-Schmidt, H., Rim, K., Gribelyuk, M.A., Mocuta, A., Ajmera, A., Copel, M., Guha, S., Bojarczuk, N., Callegari, A., D'Emic, C., Kozlowski, P., Chan, K., F

Year:

2000

Language:

english

File:

PDF, 401 KB

english, 2000

44

Electron holography of Si:C films and Si:C-based devices

Gribelyuk, M. A., Adam, T. N., Ontalus, V., Ronsheim, P. R., Kimball, L., Schonenberg, K. T.

Journal:

Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 1.92 MB

english, 2011

45

Preface

Hunter, Jerry, Gribelyuk, Michael

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2010

Language:

english

File:

PDF, 295 KB

english, 2010

46

Quantitative analysis of one-dimensional dopant profile by electron holography

McCartney, M. R., Gribelyuk, M. A., Li, Jing, Ronsheim, P., McMurray, J. S., Smith, David J.

Journal:

Applied Physics Letters

Year:

2002

Language:

english

File:

PDF, 588 KB

english, 2002

47

Microstructure and thermal stability of HfO[sub 2] gate dielectric deposited on Ge(100)

Gusev, E. P., Shang, H., Copel, M., Gribelyuk, M., D’Emic, C., Kozlowski, P., Zabel, T.

Journal:

Applied Physics Letters

Year:

2004

Language:

english

File:

PDF, 569 KB

english, 2004

48

In situ investigation of growth and thermal stability of ultrathin Si layers on the HfO[sub 2]∕Si (100) high-κ dielectric system

Lebedinskii, Yu. Yu., Zenkevich, A., Gusev, E. P., Gribelyuk, M.

Journal:

Applied Physics Letters

Year:

2005

Language:

english

File:

PDF, 331 KB

english, 2005

49

[IEEE 2006 International Symposium on VLSI Technology, Systems, and Applications - Hsinchu, Taiwan (2006.4.24-2006.4.24)] 2006 International Symposium on VLSI Technology, Systems, and Applications - Tunable Workfunction for Fully Silicied Gates (FUSI) and Proposed Mechanisms

Kim, Y., Cabral, C., Gusev, E., Gignac, L., Gribelyuk, M., Jeong, M.

Year:

2006

Language:

english

File:

PDF, 2.34 MB

english, 2006

50

[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - Microstructure evolution of electroplated Cu during room temperature transient

Gribelyuk, M.A., Malhotra, S.G., Locke, P.S., DeHaven, P., Fluegel, J., Parks, C., Simon, A.H., Murphy, R.

Year:

2000

Language:

english

File:

PDF, 273 KB

english, 2000

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